The HNEC FV12 Vacuum Drying Machine Equipment can be used for drying the perovskite thin film layer deposited on a glass substrate. It is centrally controlled through HMI and programmatically implemen
MOREThe Batch Style High Vacuum Magnetron Sputtering Equipment can be used to deposit metal, semiconductor, and insulator films on different substrates such as glass, silicon wafer, metal, PET, etc. It is
MOREApplied for depositing NiOx, ITO, and other nanometer films on glass substrates.
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